Photoelasticity for Designers

The ending chapters deal with the principles and application of the birefringent coating and distorted model techniques. This book will prove useful to photoelasticians, design engineers, and students.

Photoelasticity for Designers

Photoelasticity for Designers covers the fundamental principles and techniques of photoelasticity, with an emphasis on its value as an aid to engineering design. This book is divided into 12 chapters, and begins with an introduction to the essential optical effects necessary for an understanding of the photoelastic phenomena. The next chapters describe the concept and features of polariscopes; the characterization of photoelastic materials; the formulation and testing of two-dimensional models of photoelasticity; and the application of model stresses to prototypes for the analysis of stresses occurring in the plane of the model, effectively of uniform thickness. These topics are followed by a discussion of the frozen stress technique and a comparison of the various materials that can be used for models in the technique. The ending chapters deal with the principles and application of the birefringent coating and distorted model techniques. This book will prove useful to photoelasticians, design engineers, and students.

More Books:

Photoelasticity for Designers
Language: en
Pages: 458
Authors: R. B. Heywood
Categories: Technology & Engineering
Type: BOOK - Published: 2013-09-03 - Publisher: Elsevier

Photoelasticity for Designers covers the fundamental principles and techniques of photoelasticity, with an emphasis on its value as an aid to engineering design. This book is divided into 12 chapters, and begins with an introduction to the essential optical effects necessary for an understanding of the photoelastic phenomena. The next
Photoelasticity
Language: en
Pages: 292
Authors: Masataka Nisida, Kozo Kawata
Categories: Science
Type: BOOK - Published: 2012-12-06 - Publisher: Springer Science & Business Media

Thirty-five papers were presented at the International Symposium on Photoelasticity, Tokyo, 1986, representing fifty-five authors. Eighteen of these papers were presented by Japanese photoelasticians and seventeen by leading foreign authorities from eleven countries (Austria, Canada, Czechoslovakia, F.R. of Germany, France, Greece, India, Switzerland, UK, USA and USSR) • This is
Photoelasticity
Language: en
Pages: 316
Authors: M. M. Frocht
Categories: Technology & Engineering
Type: BOOK - Published: 2014-05-12 - Publisher: Elsevier

Photoelasticity contains the proceedings of the international symposium on photoelasticity, held at the Illinois Institute of Technology, Chicago, Illinois in October 1961. The book presents papers presented to an international delegation of scientists and experts in the field of photoelasticity. Its purpose is to encompass on an international scale the
Integrated Photoelasticity
Language: en
Pages: 203
Authors: Hillar Aben
Categories: Integrated photoelastic stress analysis
Type: BOOK - Published: 1979 - Publisher: McGraw-Hill International Book Company

Books about Integrated Photoelasticity
Photoelasticity in Theory and Practice
Language: en
Pages: 248
Authors: V. Brcic
Categories: Technology & Engineering
Type: BOOK - Published: 2014-05-04 - Publisher: Springer

Books about Photoelasticity in Theory and Practice